Ultra High Vacuum Chemical Vapor Deposition Techniques for Economic Growth of Silicon Nanowires

Ultra High Vacuum Chemical Vapor Deposition (UHVCVD) reactor has been used to grow silicon nanowires via innovative economical approaches using chemical active materials as catalysts such aluminum. Scanning Electron Microscopy study the success of growth for further investigations and advanced applications solar cells. Solar manufacturers are looking improve yield cell efficiency lower manufacturing costs overall. One main goals this project is tear down various parameters involved in current photovoltaic panels it one or more directions (properties, performance, costs). The addressing market with special concern goal. mechanical flexibility plastic high demands all onto curved surfaces architectural integration. Polycarbonate AND/OR poly methyl methacrylate encapsulation modules usage fabricate cells can be emerging technologies delivering excellent performance durability at a competitive cost. Although glass protective facing still account majority installations modules, however, expected that adaptation these new will rapidly gain share. vapor deposition done two approaches. Alternative techniques lithographic formation mask provide advantages low-cost processing, especially where simple repeating pattern required.